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  4. Sample heating and manipulation

sample heating and manipulation.

Depending on sample size and temperature requirements we offer:

  • Laser heating
  • Resistive heating
  • Radiation heating
  • Direct current heating

Sample size up to 4” wafers, sample temperature up to 1100°C.
Heater stages have up to five degrees of freedom of movement to ensure maximum sample alignment flexibility for RHEED studies. All heating solutions are compatible with high-oxygen-pressure environment.

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