pulsed laser deposition.
We are specialized in the design and production of customised, thin-film deposition equipment, with a focus on pulsed laser deposition (PLD). Our pulsed laser deposition systems ensure the best flexibility for RHEED studies and parameter reproducibility designed for thin-film research at atomic level. Our systems are ideally suited and field proven for research on a large variety of materials including complex oxides, from small to large area samples and wafer platforms.
- Single monolayer growth control with RHEED
- Down to 5.0×10-10 mbar base pressure
- Up to 1100°C growth temperature
- Integration of other PVD techniques
- Remote support, service and on site training by TSST engineers
PLD systems and components.
Customised design and integration
Systems are adapted and integrated to existing beam lines, characterization tools and cluster setups, compatible with standard sample platforms such as flagstyle sample plates. We are experienced with the integration of other deposition equipment in a PLD system solution, including sputtering, evaporators and ion sources.
Customized cluster setups
One laser, multiple systems, PLD combined with other PVD systems.